North Amiercan Nanotech, Inc.                                           Contact Us:

12701 Welcome Lane                                                               P. 612-819-5149

Burnsville, MN 55337                                                              E. northamericananotech@icloud.com

www.northamericananotech.com                                      Skype. dmmontag612

 

  • Facebook Basic Black
  • LinkedIn Basic Black
  • Twitter Basic Black
FFK Logo.png

 (Click on logo to go to the web site)

Futek Furnace designs & manufactures a broad range of MVAO (magnetic vacuum annealing oven) tools for both R&D and production applications, specializing in tools for magnetic, ferroelectric, piezoelectric and spintronic device fabrcation and bridgeman furnaces. Futeck Furnance supports customers in the data storage, MEMS and spintronics markets worldwide. 
Low-field MVAO Systems

Low-field MVAO Systems provide fields from 2000 oe to <1.0 Tesla employing either a fixed field permanent magnet or a variable field electro-magnet. The systems provide a board range of thermal control, high vacuum and automated 200-300 mm wafer handling. Low-fied systems are in wide us in the data storage industry. 

High-field MVAO Systems

High-field MVAO Systems provide fields from 1.0 to 2.0 Tesla employing either a fixed filed permanent magnet or a variable field superconducting magnet. These systems provide a board range of thermal control, high vacuum and automated 200-300 mm wafer handling. High-field systems are in wide use in the data storage and spintronics industries. 

Ultra-high-field MVAO Systems

Ultra-high-field MVAO Systems provide fields >2.0 Tesla employing a variable field superconducting magnet. The systems provide a board range of thermal control, high vacuum and automated 200-300 mm wafer handling. Ulta-high-field systems are in wide use in the data storage and spintronic industries. 

High Volume Manufacturing
Systems

High Volume Manufacturing (HVM) Systems provide the highest throughput via a 50-100 X 200/300mm wafer batch. The HVM systems are in wide use within the data storage and spintronics markets. 

R&D MVAO Systems

R&D MVAO Systems are available to meet a broad range of research and development applications. Fields can range from 2000 oe to 10.0 Tesla. Process temperatures can from 150 deg. C. to 600 deg. C.. Fixturing for substrates from coupon sized to 300mm wafers is available. R&D systems are in wide use in university, govenment and industrial R&D labs.   

Bridgman
Furnaces

Vertical Bridgman Single Crystal Growth Furnace for Oxide and Compound materials features:

Multi Heating Zone control up to 1800ºC

Suitable for Bigger Diameter and Longer Single Crystal Growth with under support Crucible

Stable Ultra low Speed control for Crucible movement : 0.1 mm/Hr

Reliable Temperature Control System

LBO, LGS, BSO, BGO, GaAs, LT, LN