Your Source for Thin Film Process & Test Solutions!
Attention Re: US Chips Act & Corporate Funding:
US government & corporations to invest >$100B USD in the semiconductor industry over the next 10 yrs.
NANI's sales & marketing management expertise will strategically position your process & test equipment to compete effectively and close sales during this period of unprecedented growth!
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Yokohama used Futek Furnace designs & manufactures a broad range of MVAO (magnetic vacuum annealing oven) stand-alone annealing ovens and magnetizers for both R&D and production applications, specializing in tools for magnetic, ferroelectric, piezoelectric and spintronic device fabrication Futek Furnace supports customers in the data storage, sensor, MEMS and spintronics markets worldwide.
Low-field MVAO Systems
Low-field MVAO Systems provide fields from 2000 oe to <1.0 Tesla employing either a fixed field permanent magnet or a variable field electro-magnet. The systems provide a board range of thermal control, high vacuum and automated 200-300 mm wafer handling. Low-fied systems are in wide us in the data storage industry.
High-field MVAO Systems
High-field MVAO Systems provide fields from 1.0 to 2.0 Tesla employing either a fixed filed permanent magnet or a variable field superconducting magnet. These systems provide a board range of thermal control, high vacuum and automated 200-300 mm wafer handling. High-field systems are in wide use in the data storage and spintronics industries.
Ultra-high-field MVAO Systems
Ultra-high-field MVAO Systems provide fields >2.0 Tesla employing a variable field superconducting magnet. The systems provide a board range of thermal control, high vacuum and automated 200-300 mm wafer handling. Ulta-high-field systems are in wide use in the data storage and spintronic industries.
R&D MVAO Systems
R&D MVAO Systems are available to meet a broad range of research and development applications. Fields can range from 2000 oe to 10.0 Tesla. Process temperatures can from 150 deg. C. to 600 deg. C.. Fixturing for substrates from coupon sized to 300mm wafers is available. R&D systems are in wide use in university, govenment and industrial R&D labs.
Bridgman Furnaces
Vertical Bridgman Single Crystal Growth Furnace for Oxide and Compound materials features:
Multi Heating Zone control up to 1800ºC
Suitable for Bigger Diameter and Longer Single Crystal Growth with under support Crucible
Stable Ultra low Speed control for Crucible movement : 0.1 mm/Hr
Reliable Temperature Control System
LBO, LGS, BSO, BGO, GaAs, LT, LN