North Amiercan Nanotech, Inc.                                           Contact Us:

12701 Welcome Lane                                                               P. 612-819-5149

Burnsville, MN 55337                                                              E. northamericananotech@icloud.com

www.northamericananotech.com                                      Skype. dmmontag612

 

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Nordiko designs & manufactures a broad range of PVD and ion-beam process tools for both R&D and production applications, specializing in tools for magnetic, ferroelectric, piezoelectric and spintronic device fabrication. Nordiko supports customers in the spintronics, data storage, non-volatile memory and magnetic sensor & inductor markets worldwide. 
Mnem-iX
Broad Ion Beam System

When Precision is paramount and the Mnem-iX has a track record of achievement for MRAM production. Mnem-iX uses a central, industry standard, wafer handling platform. The platform can be equipped with two 3600 or 3800 deposition modules and two smaller 7000 series modules. The latter may be used for wafer pre-clean and surface modification.

7500 Broad Ion Beam Milling system

The 7500 delivers the performance needed when manufacturing a nano scale world. This results in repeatable milling performance with very good within wafer non-uniformity from a very low divergence collimated ion beam. Dual plasma bridge neutralisers couple electrons to the beam plasma for effective charge neutralisation at illuminated surfaces. Interfaced to an industry standard SEMI MESC compliant wafer handling platform the system may be configured for processing various wafer sizes up to 200 mm diameter and platens up to 225 mm square.

3400/3600/3800 Broad Ion Beam Systems

The 3400/3600/3800  are  advanced automatic vacuum coating systems designed for the deposition of dielectric and metallic films. The modules are equipped to be interfaced to a wafer handling platform (SEMI height). A single ion source illuminates the selected one, of four/six/eight available, target positions creating a deposition flux. An auxiliary ion source aimed at the substrate table is available as an option that can be used for wafer pre-clean and/or direct illumination of the growing film.

Nordiko 3000

The Nordiko 3000 is a multi-target dual source ion beam deposition system. The detailed implementation has recently been revised and the system benefits from our latest generation of broad ion beamsources and advanced accelerators. The configuration draws heavily of the original 3000 that we introduced more than twenty-five years ago. 

Nordiko α120

The Nordiko alpha-120 laboratory system comprises a vacuum process module, mounted on a cabinet housing supporting power supplies and power management systems. The system may beconfigured for atmospheric cycling to load samples, or may be fitted with a vacuum load lock.

Nordiko N2000 

The N2000 is a compact sputtering system with four 150 mm electrodes mounted in a confocal configuration. The electrodes sputter material onto a central rotating worktable. Designed to coat substrates up to 200 mm diameter the system combines great flexibility with substantial capability.