AXIC provides thin film solutions enabling low cost, high value XRF and Plasma Systems for ICP, DRIE, and PECVD. Axic's systems are used worldwide for etch and deposition of thin films, plasma surface treatment adn plasma cleaning.
The IsoLok 5000 provides an attractive capability for depositing films on photovoltaic cells via an inductively Coupled Plasma (ICP) . Up to 4 different films can be deposited without breaking vacuum. A Load-Lock module is provided for transferring samples in and out of vacuum system without having to vent the chamber to atmosphere
Bench Mark systems are an affordable plasma tool that can be used in research, process development or low volume production for precise etching and deposition on substrates up to 8" in diameter and can also accommodate pieces of wafer. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch and deposition bottom electrodes available for easy installation into the chamber unit.
A cost-effective plasma processing system for Reactive Ion Etching and/or Plasma Enhanced Chemical Vapor Deposition. The Multi-Mode System is based on a modular design starting with a universal chamber and cabinet unit with Planar, RIP and PECVD electrode modules available for easy installation into the chamber unit.
A Unique Modular Approach to Barrel Plasma Processing The PlasmaSTAR® Series of Plasma Processing Systems defines a new concept in barrel plasma processing. The systems are based on a modular design concept. Starting with a universal base unit, multiple electrode modules are available for easy insertion into the base unit.